An Expert Advisor for Photolithography
Abstract
The Photolithography Advisor is a program for the diagnosis and correction of negative resist photolithography defects occurring during integrated circuit fabrication. Given a set of observed symptoms on a wafer, the Advisor diagnoses defects due to these symptoms and recommends corrective action for each. An early prototype of the program was tested in a research lab, where experimental ICs were processed. A more thorough experiment is now in progress to measure the system's performance in a manufacturing environment.
Cite
Text
Cline et al. "An Expert Advisor for Photolithography." International Joint Conference on Artificial Intelligence, 1985.Markdown
[Cline et al. "An Expert Advisor for Photolithography." International Joint Conference on Artificial Intelligence, 1985.](https://mlanthology.org/ijcai/1985/cline1985ijcai-expert/)BibTeX
@inproceedings{cline1985ijcai-expert,
title = {{An Expert Advisor for Photolithography}},
author = {Cline, Terry and Fong, Wendy and Rosenberg, Steven},
booktitle = {International Joint Conference on Artificial Intelligence},
year = {1985},
pages = {411-413},
url = {https://mlanthology.org/ijcai/1985/cline1985ijcai-expert/}
}